Release of the New X-ray Photoelectron Spectrometer JPS-9030 – The definitive XPS for high-speed, high-precision depth profiling

JEOL Ltd. (President Gon-emon Kurihara) has completed the development of the X-ray Photoelectron Spectrometer (XPS) JPS 9030, with sales scheduled to start on April 10, 2015.

Product development background

In recent years, there has been a growing demand to perform high quality surface analysis quickly, easily and reproducibly on any kind of sample for any level user. The JPS-9030 is equipped with a newly-designed user interface that further improves operability and also debuts a sophisticated, new modern and sleek exterior design.

Main Features

Depth profiling optimized for the application

The newly-developed Kaufman-type etching ion source provides etching rates from 1 nm/min to 100 nm/min (SiO2equivalent), and allows a wide range of settings. It is capable of depth profiles suitable for any application, from measurements demanding precision to processes that require speed. The mounting of the Kaufman-type etching ion source to the specimen exchange chamber facilitates prevention of contamination of the measurement chamber.

Newly-developed software provides even greater ease-of-use

SpecSurf Ver. 2.0 now incorporates a ribbon-style GUI, offering a user-friendly environment in which all operations can be performed with the mouse. With JEOL’s own automatic qualitative analysis function, it is possible to sequentially perform qualitative, quantitative and chemical state analyses for multiple acquisition points.

Ultra-high surface sensitivity

The JPS-9030 supports techniques like Angle-Resolved XPS (ARXPS) and Total Reflection XPS (TRXPS), and is capable ultra-high sensitive analysis of the top surfaces of 1 nm (standard measurement method 6 nm or more).

A wealth of options

Monochromatic X-ray sources

Argon gas cluster ion source suitable for organic samples

Infra-red heating system capable of temperatures of 1,000°C or higher

Transfer vessel to protect specimens from exposure to the atmosphere

Main Specifications

Intensity

(MgK?, 300W equivalent) 1,000,000 cps or more (at Ag3d5/2 FWHM is 1.0 eV)

X-ray source Mg/Al twin anode

Input-lens system Cylindrical electrostatic lens

Energy analyzer Electrostatic hemispherical analyzer

Energy sweep method Constant Analyzer Energy and Constant Retarding Ratio

Detector multichannel plate

Ion gun Kaufman type ion gun

Base pressure 7 × 10-8 Pa or better

Bake-out system Built-in heater, automatic control

JPS-9030

Annual unit sales target

20 units/year

JEOL Ltd.

JEOL is a world leader in electron optical equipment and instrumentation for high-end scientific and industrial research and development. Core product groups include electron microscopes (SEMs and TEMs), instruments for the semiconductor industry (electron beam lithography and a series of defect review and inspection tools), and analytical instruments including mass spectrometers, NMRs and ESRs.

For more information about JEOL Ltd. or any JEOL products, visit www.jeol.com.

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