JEOL Ltd. (President and CEO: Izumi Oi) has developed the new 300kV atomic resolution analytical microscope “GRAND ARM™ 3” and launched it on August 3, 2026.

Development Background

JEOL’s flagship model, the 300kV atomic resolution electron microscope, has greatly enhanced its observation and analysis capabilities as the GRAND ARM™ 3.

JEOL’s joint development with CEOS GmbH, Germany has enabled the latest aberration correctors, Large Aperture STEM Corrector (LASCOR) and Advanced TEM Corrector (ATCOR) to be installed in GRAND ARM™ 3. It realizes observation and analysis under larger aperture angles than conventional models. As a result, unprecedented ultra-high resolution observation and analysis are possible in both STEM and TEM modes.

In addition, the integration of a new high-speed scan system into GRAND ARM™ 3 enables the acquisition of STEM images of at least 30 frames per second. In-situ atomic-level observation and analysis of dynamic phenomena, which were previously difficult to study using STEM, open up new possibilities for materials research.

Main Features

LASCOR (Large Aperture STEM CORrector)

LASCOR, the STEM aberration corrector, uses a three-stage hexapole aberration-correction electron optical system to significantly expand the aberration-corrected area on Ronchigram in STEM mode. This makes it possible to perform observations at large convergence semi-angles and obtain high-resolution STEM images with reduced diffraction limits.
In addition, as the focal depth becomes shallower as the convergence semi-angle expands, it is possible to perform depth profiling of the specimen with high resolution by performing STEM observation while changing the focal length of the objective lens in minute increments.

ATCOR (Advanced TEM CORrector)

The ATCOR (Advanced TEM Corrector) utilizes an optimized, two-stage hexapole aberration-correction electron optical system to correct six-fold astigmatism, which was previously uncorrectable with conventional TEM aberration correctors. This allows electrons scattered at wider angles to contribute to imaging without being affected by aberration, improving the resolution in TEM mode. In diffraction mode, the effect of aberration on electrons scattered at wide angles is reduced, so it is possible to obtain diffraction figures with suppressed distortion.

Ultra-high resolution and Ultra-high sensitivity EDS analysis

LASCOR allows us to select larger convergence angles to realize electron probes with both high probe current and high atomic-scale resolution. In addition, the EDS analysis system with a 158 mm² dual SDD, providing high X-ray detection efficiency, enables fast EDS analysis using high resolution observation probes.

High-speed scan system

The combination of a dedicated scan coil and a scintillator with a short attenuation time realizes STEM observation at 30 frames or more per second. It can be applied to in-situ observation at atomic resolution and enables tracking of dynamic phenomena such as chemical reactions in real time.

Specifications

• STEM
  • HAADF-STEM resolution : 49 pm or less（at 300 kV） / 76 pm or less（at 80 kV）
  • Aberration correction angle range : Semi-angle of 85 mrad or more（at 300 kV）
• TEM
  • TEM lattice resolution : 50 pm or less（at 300 kV）
  • TEM information limit : 60 pm or less（at 300 kV）
• EDS
  • EDS detector : 158mm²
  • EDS solid angle : 1.4sr
• High-speed scan
  • Maximum scan speed^※ : 83 ns/pixel or faster
  • Minimum flyback time : 20 µs or less（at a scan speed of 83 ns/pixel）
  • Frame rate^※ : 30 fps or higher (with pixel size 512 x 512）
  • Only the ADF detector (attached to the ADF2 port) configured in this product is supported.